Laser Produced Plasma for EUV Light Source For Lithography
نویسندگان
چکیده
منابع مشابه
CO2 Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography
High average power EUV light source has been the “most critical” issue in the research and development of the EUV lithography system in one decade. EUV LLC and International Sematech significantly stimulated the global research community to work seriously to advance plasma technology in achieving the goal of the EUV source, required by the semiconductor industry. It is instructive to look into ...
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The dynamics of debris from laser produced Tin (Sn) plasma was investigated for EUV light source. The kinetic behaviors of the Sn atoms and of the dense particles from Sn droplet target irradiated by double pulses from the Nd:YAG laser and the CO2 laser were also investigated by the laser-induced fluorescence imaging method and a high-speed imaging, respectively. After the pre-pulse irradiation...
متن کاملEffects of Plasma Spatial Profile on Conversion Efficiency of Laser Produced Plasma Sources for EUV Lithography
Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector sy...
متن کاملRadiation-Hydrodynamics, Spectral, and Atomic Physics Modeling of Laser-Produced Plasma EUV Lithography Light Sources
Tin, lithium, and xenon laser-produced plasmas are attractive candidates as light sources for extreme ultraviolet lithography (EUVL). Simulation of the dynamics and spectral properties of plasmas created in EUVL experiments plays a crucial role in analyzing and interpreting experimental measurements, and in optimizing the 13.5 nm radiation from the plasma source. Developing a good understanding...
متن کاملNumerical Simulation of Laser-produced Plasma Devices for Euv Lithography Using the Heights Integrated Model
Laser-produced plasma (LPP) devices have been modeled as the light source for extreme ultraviolet (EUV) lithography. A key challenge for LPP is achieving sufficient brightness to support the throughput requirements of high-volume manufacturing. An integrated model (HEIGHTS) was applied to simulate the environment of EUV sources and optimize their output. The model includes plasma evolution and ...
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ژورنال
عنوان ژورنال: The Review of Laser Engineering
سال: 2004
ISSN: 0387-0200,1349-6603
DOI: 10.2184/lsj.32.330